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12 results

Conference Proceedings

1. Detector calibration at the radiometry laboratory of the Physikalisch-Technische Bundesanstalt in the VUV and soft x-ray spectral ranges using synchrotron radiation

T. Lederer ; H. Rabus ; F. Scholze ; R. Thornagel ; G. Ulm

Pub. info.:	X-ray and ultraviolet sensors and applications : 13-14 July 1995, San Diego, California. pp.92-107, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2519

Technical Paper

2. Ion Analytical Characterisation of the RIT 22 Ion Thruster

F. Scholze ; M. Tartz ; H. Neumann ; H. Leiter ; R. Kukies ; D. Feili ; S. Weis

Pub. info.:	AIAA meeting papers on disc. 2007. Reston, Va.. American Institute of Aeronautics and Astronautics
Title of ser.:	AIAA Paper : AIAA/ASME/SAE/ASEE Joint Propulsion Conference and Exhibit
Ser. no.:	2007

Conference Proceedings

3. Polarization dependence of multilayer reflectance in the EUV spectral range

F. Scholze ; C. Laubis ; C. Buchholz ; A. Fischer ; A. Kampe ; S. Ploger ; F. Scholz ; G. Ulm

Pub. info.:	Emerging lithographic technologies XI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6517

Conference Proceedings

4. Metrotogy of EUV masks by EUV-scatterometry and finite element analysis

J. Pomplun ; S. Burger ; F. Schmidt ; F. Scholze ; C. Laubis

Pub. info.:	Photomask and next-generation lithography mask technology XV. 1 pp.70280P-1-70280P-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7028

Conference Proceedings

5. Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM simulation

F. Scholze ; C. Laubis ; G. Ulm ; U. Dersch ; J. Pomplun

Pub. info.:	Emerging lithographic technologies XII. 2 pp.69213R-1-69213R-11, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6921

Conference Proceedings

6. Optical metrology of micro- and nanostructures at PTB: status and future developments

B. Bodermann ; E. Buhr ; G. Ehret ; F. Scholze ; M. Wurm

Pub. info.:	Ninth International Symposium on Laser Metrology. 1 pp.71550V-1-71550V-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7155

Conference Proceedings

7. Optimal sets of measurement data for profile reconstruction in scatterometry

H. Gross ; A. Rathsfeld ; F. Scholze ; M. Baer ; U. Dersch

Pub. info.:	Modeling aspects in optical metrology : 18-19 June 2007, Munich, Germany. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6617

Conference Proceedings

8. The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks

F. Scholze ; C. Laubis ; U. Dersch ; J. Pomplun ; S. Burger ; F. Schmidt

Pub. info.:	Modeling aspects in optical metrology : 18-19 June 2007, Munich, Germany. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6617

Conference Proceedings

9. Finite element analysis of EUV lithography

J. Pomplun ; S. Burger ; F. Schmidt ; F. Scholze ; C. Laubis ; U. Dersch

Pub. info.:	Modeling aspects in optical metrology : 18-19 June 2007, Munich, Germany. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6617

10.

Conference Proceedings

10. Metrology in the soft x-ray range: from EUV to the water window

C. Laubis ; F. Scholze ; G. Ulm

Pub. info.:	Advances in optical thin films III : 2-3 September 2008, Glasgow, United Kingdom. pp.71011U-1-71011U-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7101

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Author: F. Scholze