1.

Conference Proceedings
Conference Proceedings
1. Ultra-Shallow Junctions Formed by Co-Implantation and Sub-Melt Laser Annealing
S. B. Felch ; A. Falepin ; S. Seven ; E. Augendre ; T. Noda ; V. Parihar ; F. Nouri ; T. Hoffinann ; B. Pawlak ; P. Eyben ; W. Vandervorst ; S. Thirupapuliyur ; R. Schreuelkamp ; E. Collart ; H. Graoui
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment.  pp.105-112,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(2)
2.

Conference Proceedings
Conference Proceedings
2. Study of Ni-Silicide Contacts to Si:C Source/Drain.
S. Mertens ; Y. Cho ; F. Nouri ; R. Schreutelkamp ; Y. Kim ; P. Verheyen ; J. Steenbergen ; C. Vrancken ; H. Bender ; O. Richard ; B. Van Daele ; W. Vandervorst ; P. Absil ; S. Kubicek ; C. Demeurisse ; Z. Tokei ; A. Lauwers ; L. Geenen
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment.  pp.139-148,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(2)