1.

Conference Proceedings
Conference Proceedings
1. Full field EUV lithography turning into a reality at IMEC
R. Jonckheere ; G. F. Lorusso ; A. M. Goethals ; J. Hermans ; B. Baudemprez ; A. Myers ; I. Kim ; A. Niroomand ; F. Iwamoto ; N. Stepanenko ; K. Ronse
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
2.

Conference Proceedings
Conference Proceedings
2. Innovative metrology for wafer edge defectivity in immersion lithography
I. Pollentier ; F. Iwamoto ; M. Kocsis ; A. Somanchi ; F. Burkeen ; S. Vedula
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Split and design guidelines for double patterning
V. Wiaux ; S. Verhaegen ; S. Cheng ; F. Iwamoto ; P. Jaenen
Pub. info.: Optical Microlithography XXI.  1  pp.692409-1-692409-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
4.

Conference Proceedings
Conference Proceedings
4. A methodology for double patterning compliant split and design
V. Wiaux ; S. Verhaegen ; F. Iwamoto ; M. Maenhoudt ; T. Matsuda
Pub. info.: Lithography Asia 2008.  1  pp.71401X-1-71401X-14,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
5.

Conference Proceedings
Conference Proceedings
5. EUV lithography program at IMEC
A. M. Goethals ; R. Jonckheere ; G. F. Lorusso ; J. Hermans ; F. V. Roey ; A. Myers ; M. Chandhok ; I. Kim ; A. Niroomand ; F. Iwamoto ; N. Stepanenko ; R. Gronheid ; B. Baudemprez ; K. Ronse
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
6.

Conference Proceedings
Conference Proceedings
6. Investigation of mask defectivity in full field EUV lithography
R. Jonckheere ; F. Iwamoto ; G. F. Lorusso ; A. M. Goethals ; K. Ronse
Pub. info.: Photomask technology 2007.  1  pp.673012-1-673012-12,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
7.

Conference Proceedings
Conference Proceedings
7. Dependence of EUV mask printing performance on blank architecture
R. Jonckheere ; Y. Hyun ; F. Iwamoto ; B. Baudemprez ; J. Hermans
Pub. info.: Emerging lithographic technologies XII.  2  pp.69211W-1-69211W-14,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921