1.

Conference Proceedings
Conference Proceedings
1. Nanometer-level metrology with a low-voltage CD SEM
Yoshimura,T. ; Ezumi,M. ; Otaka,T. ; Todokoro,H. ; Yamamoto,J. ; Terasawa,T.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.61-70,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Development of critical dimension measurement scanning electron microscope for ULSI(S-8000 series)
Ezumi,M. ; Otaka,T. ; Mori,H. ; Todokoro,H. ; Ose,Y.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.105-113,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725