1.

Conference Proceedings
Conference Proceedings
1. Photomask CD correlation of an optical linewidth measurement tool and a scanning electron microscope with reference to a Stylus NanoProfilometer
Kasprowicz,B.S. ; Eynon,B.G. ; Morrison,T.B. ; Wang,C.-Y.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.338-349,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Killer defects caused by localized sub-100-nm critical dimension reticle errors
Vacca,A. ; Eynon,B.G. ; Yeomans,S.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.642-648,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
3.

Conference Proceedings
Conference Proceedings
3. Inspecting the new generation of reticles using UV imaging
Merrill,M. ; Wiley,J.N. ; Eynon,B.G.
Pub. info.: 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany.  pp.55-62,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3665
4.

Conference Proceedings
Conference Proceedings
4. Contributions by blank vendors to critical dimension and defect errors
Unruh,J. ; Eynon,B.G.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.90-97,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
5.

Conference Proceedings
Conference Proceedings
5. Defect dispositioning using mask printability on attenuated phase-shift production photomasks
Novak,J.W. ; Eynon,B.G. ; Poortinga,E. ; Rosenbusch,A. ; Eran,Y.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.881-889,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
6.

Conference Proceedings
Conference Proceedings
6. 100-nm defect detection using an existing image acquistion system (Invited Paper)
Vacca,A. ; Eynon,B.G. ; Yeomans,S.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.464-470,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
7.

Conference Proceedings
Conference Proceedings
7. Defect dispositioning using mask printability on attenuated phase-shift production photomasks
Novak,J.W. ; Eynon,B.G. ; Rosenbusch,A. ; Goldenshtein,A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.488-498,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
8.

Conference Proceedings
Conference Proceedings
8. DUV pellicle quality assessment based on customer priorities
Wood,J.L. ; Eynon,B.G. ; Kalk,F.D.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.422-428,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546