1.

Conference Proceedings
Conference Proceedings
1. Feasibility studies of operating KrF lasers at ultranarrow spectral bandwidths for 0.18-ｦﾌm line widths
Ershov,A.I. ; Hofmann,T. ; Partlo,W.N. ; Fomenkov,I.V. ; Everage,G. ; Das,P.P. ; Myers,D.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.1021-1030,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Performance characteristics of ultranarrow ArF Laser for DUV Lithography
Ershov,A.I. ; Besaucele,H. ; Das,P.P.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.1030-1037,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Performance of very high repetition rate ArF lasers
Hueber,J.-M. ; Besaucele,H. ; Das,P.P. ; Eis,R. ; Ershov,A.I. ; Fleurov,V.B. ; Gaidarenko,D. ; Hofmann,T. ; Melcher,P.C. ; Partlo,W.N. ; Nikolaus,B.K. ; Smith,S. ; Webb,K.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1418-1423,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Comparison of ArF and KrF laser performance at 2 kHz for microlithography
Besaucele,H. ; Das,P.P. ; Duffey,T.P. ; Embree,T.J. ; Ershov,A.I. ; Fleurov,V.B. ; Grove,S.L. ; Melcher,P.C. ; Ness,R. ; Padmabandu,G.G.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1476-1480,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
5.

Conference Proceedings
Conference Proceedings
5. Laser spectrum line shape metrology at 193 nm
Ershov,A.I. ; Padmabandu,G.G. ; Tyler,J.D. ; Das,P.P.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1405-1417,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
6.

Conference Proceedings
Conference Proceedings
6. Feasibility of highly line-narrowed F2 laser for 157-nm microlithography
Ershov,A.I. ; Duffey,T.P. ; Onkels,E. ; Partlo,W.N. ; Sandstrom,R.L.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1529-1536,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
7.

Conference Proceedings
Conference Proceedings
7. High-temperature LPP collector mirror [6151-152]
Feigl, T. ; Yulin,S. ; Benoit, N. ; Kaiser,N. ; Bowering, N. R. ; Ershov,A.I. ; Khodykin,O. V. ; Viatella, J. W. ; Bruzzone,K.A. ; Fomenkov, I. V. ; Myers.D.W
Pub. info.: Emerging Lithographic Technologies X.  pp.61514A-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
8.

Conference Proceedings
Conference Proceedings
8. Challenges of laser spectrum metrology in 248- and 193-nm lithography
Ershov,A.I. ; Smith,S.
Pub. info.: Optical Microlithography XIV.  4346  pp.1219-1228,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346