1.

Conference Proceedings
Conference Proceedings
1. Image processing for SEMs: is this the way to go for CD metrology?
Eric P. Solecky ; Charles N. Archie
Pub. info.: Metrology, inspection, and process control for microlithography XIII : 15-18 March, 1999, Santa Clara, California.  2  pp.796-806,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3677
2.

Conference Proceedings
Conference Proceedings
2. CD-SEM edge width applications and analysis
Eric P. Solecky ; Roger S. Cornell
Pub. info.: Metrology, inspection, and process control for microlithography XIII : 15-18 March, 1999, Santa Clara, California.  1  pp.315-325,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3677