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20 results

Conference Proceedings

1. Real-time line-width measurements: a new feature for reticle inspection systems

Eran,Y. ; Greenberg,G. ; Joseph,A. ; Lustig,C. ; Mizrahi,E.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.480-491, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

2. Definition of new quality criteria and assessment means for masks at 150-nm design rules and beyond

Baracchi,E. ; Bruck,H.-J. ; Engel,T. ; Eran,Y. ; Lalanne,F.P. ; Maurin,O. ; Ordynskyy,V. ; Schatz,T. ; Sommer,K.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.178-188, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

3. Development of a new defect sensitivity monitor for advanced OPC reticle technology

Staud,W. ; Eran,Y. ; Reynolds,P. ; Sager,C.B.

Pub. info.:	15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany. pp.47-54, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3665

Conference Proceedings

4. Improvements to mask inspectability by use of pattern proximity correction

Rosenbusch,A. ; Bailey,V. ; Eran,Y. ; Falah,R. ; Holmes,N.J. ; Hourd,A.C. ; McArthur,A. ; Staud,W.

Pub. info.:	16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany. pp.190-199, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3996

Conference Proceedings

5. Innovative approach for concurrent CD-uniformity monitoring and reticle inspection

Sade,A. ; Fandrich,J. ; Hemar,S. ; Eran,Y.

Pub. info.:	16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany. pp.175-187, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3996

Conference Proceedings

6. Quality assessment of advanced photomasks using the Q-CAP cluster tool

Peter,K. ; Schatz,T. ; Ordynskyy,V. ; Liebe,R. ; Verbeek,M. ; Galan,G. ; Baracchi,E. ; Miramond,C. ; Bruck,H.-J. ; Scheuring,G. ; Engel,T. ; Eran,Y. ; Sommer,K. ; Hartmann,H.

Pub. info.:	17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.117-124, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4349

Conference Proceedings

7. Mask process design optimization based on quality mapping using standard mask inspection equipment

Kuo,S.C. ; Tan,T. ; Rosenbusch,A. ; Eran,Y. ; Lindman,O. ; Gottlib,G.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.459-466, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

8. Die-to-database inspection of 256-Mb DRAM reticles

Eran,Y. ; Elmaliach,N. ; Lehman,Y. ; Mizrahi,E. ; Rossman,G.

Pub. info.:	Photomask and X-Ray Mask Technology III. pp.261-266, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2793

Conference Proceedings

9. Mask inspection and real-time Inewidth measurements

Eran,Y. ; Greenberg,G. ; Joseph,A.

Pub. info.:	16th Annual BACUS Symposium on Photomask Technology and Management. pp.138-148, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2884

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Conference Proceedings

10. New approach to mask and wafer performance optimization for system-on-chip(SOC)devices

Gottlib,G. ; Eran,Y. ; Hamar,S. ; Sade,A. ; Staud,W. ; Dusa,M.V. ; Warila,S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.496-502, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

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