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15 results

Conference Proceedings

1. Hard pellicle investigation for 157-nm lithography: impact on overlay

Bruls, R. ; Uitterdijk, T. ; Cicilia, O. ; De Bisschop, P. ; Kocsis, M. K. ; Grenville, A. ; Van Peski, C. K. ; Engelstad, R. L. ; Chang, J. ; Cotte, E. P. ; Okada, K. ; Ohta, K. ; Mishiro, H. ; Kikugawa, S.

Pub. info.:	20th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.1-11, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5504

Conference Proceedings

2. Effect of electrostatic chucking on EUVL mask flatness

Mikkelson, A. R. ; Engelstad, R. L. ; Lovell, E. G. ; Aschke, L. ; Ruggeberg, F. ; Sobel, F.

Pub. info.:	20th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.120-128, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5504

Conference Proceedings

3. Predicting microfluidic response during immersion lithography scanning

Wei, A. C. ; Dicks, G. A. ; Abdo, A. Y. ; Nellis, G. F. ; Engelstad, R. L. ; Chang, J. ; Lovell, E. G. ; Beckman, W. A.

Pub. info.:	20th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.155-163, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5504

Conference Proceedings

4. Experimental verification of finite element model prediction of EUVL mask flatness during electrostatic chucking [6349-124]

Nataraju, M. ; Sohn, J. ; Mikkelson, A. R. ; Turner, K. T. ; Engelstad, R. L. ; Van Peski, C. K.

Pub. info.:	Photomask Technology 2006. pp.634939-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

5. Measuring force uniformity in electrostatic chucking of EUVL masks [6349-126]

Sohn, J. ; Veerarghavan, S. ; Turner, K. T. ; Engelstad, R. L. ; Van Peski, C. K.

Pub. info.:	Photomask Technology 2006. pp.63493B-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

6. Predicting the influence of trapped particles on EUVL reticle distortion during exposure chucking [6349-123]

Romaswamy, V. ; Turner, K. T. ; Engelstad, R. L. ; Lovell, E. G.

Pub. info.:	Photomask Technology 2006. pp.634938-634938, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

7. EUV mask and chuck analysis: simulation and experimentation [6151-12]

Nataraju, M. ; Sohn, J ; Mikkelson, A. R. ; Turner, K. T. ; Engelstad, R. L. ; Van Peski, C. K.

Pub. info.:	Emerging Lithographic Technologies X. pp.61510C-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

8. Assessment of electron projection lithography mask membrane image placement accuracy due to fabrication processes [6151-56]

Boruszewski, M. J. ; Engelstad, R. L. ; Dicks, G. A. ; Sakaue, H. ; Arimoto, H.

Pub. info.:	Emerging Lithographic Technologies X. pp.61511J-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

9. Simulating the process flow of the Nikon EPL new geometry mask

Chang, J. ; Engelstad, R. L. ; Lovell, E. G. ; Sogard, M. R.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.1278-1288, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

10.

Conference Proceedings

10. Simulating the effects of bake process parameters on resist thermal reflow

Lee, J. -W. ; Feng, Z. ; Engelstad, R. L. ; Lovell, E. G.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.1228-1239, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

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