1.

Conference Proceedings
Conference Proceedings
1. Application of scatterometry for CD and profile metrology in 193-nm lithography process development
Chen, L.-J. ; Ke, C.-M. ; Yu, S.S. ; Gau, T.-S. ; Chen, P. ; Ku, Y.-C. ; Lin, B.J. ; Engelhard, D. ; Hetzer, D. ; Yang, J.Y. ; Barry, K.A. ; Yap, L. ; Yang, W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.568-576,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. Feedforward of mask open measurements on an integrated scatterometer to improve gate linewidth control
Sendelbach, M. ; Natzle, W. ; Archie, C.N. ; Banke, B. ; Prager, D. ; Engelhard, D. ; Ferns, J. ; Yamashita, A. ; Funk, M. ; Higuchi, F. ; Tomoyasu, M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.686-702,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375