Shibahara, M. ; Yamamura, K. ; Sano, Y. ; Sugiyama, T. ; Endo, K. ; Mori, Y.
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Optical manufacturing and testing VI : 31 July-1 August 2005, San Diego, California, USA. pp.58690I-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Endo, K. ; Sato, H. ; Yoshizawa, T. ; Abe, K. ; Itoh, J. ; Kajimura, K. ; Akoh, H.
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Materials for high-temperature superconductor technologies : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A.. pp.169-174, 2002. Warrendale, Pa.. Materials Research Society
Uetani, Y. ; Fujishima, H. ; Araki, K. ; Endo, K. ; Takemoto, I..
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Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.510-517, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Dong, Q. ; Hachiya, Y. ; Endo, K. ; Himeno, K. ; Kawamura, A. ; Matsui, K.
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Health monitoring and smart nondestructive evaluation of structural and biological systems III : 15-17 March 2004, San Diego, California, USA. pp.118-126, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Mori, Y. ; Yamauchi, K. ; Yamamura, K. ; Mimura, H. ; Sano, Y. ; Saito, A. ; Endo, K. ; Souvorov, A. ; Yabashi, M. ; Tamasaku, K. ; Ishikawa, T.
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Advances in mirror technology for X-ray, EUV lithography, laser, and other applications : 7-8 August 2003, San Diego, California, USA. pp.105-111, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Mori, Y. ; Yamauchi, K. ; Yamamura, K. ; Mimura, H. ; Sano, Y. ; Saito, A. ; Endo, K. ; Souvorov, A. ; Yabashi, M. ; Tamasaku, K. ; Ishikawa, T. ; Shimura, M. ; Ishizaka, Y.
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Advances in mirror technology for X-ray, EUV lithography, laser, and other applications : 7-8 August 2003, San Diego, California, USA. pp.11-17, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Strongly correlated electron materials : physics and nanoengineering : 31 July-4 August, 2005, San Diego, California, USA. pp.593211-593212, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Matsuyama, S. ; Mimura, H. ; Yumoto, H. ; Hara, H. ; Yamamura, K. ; Sano, Y. ; Endo, K. ; Mori, Y. ; Nishino, Y. ; Tamasaku, K. ; Yabashi, M. ; Tshikawa, T. ; Yamauchi, K.
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Laser-generated, synchrotron, and other laboratory X-ray and EUV sources, optics, and applications II : 2-4 August 2005, San Diego, California, USA. pp.591804-591804, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering