1.

Conference Proceedings
Conference Proceedings
1. Some aspects on mechanisms responsible for contamination of optical components in DUV lithographic exposure tools
Fosshaug, H. ; Ekberg, M. ; Kylberg, G.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1601-1628,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Laser pattern generator challenges in airborne molecular contamination protection
Ekberg, M. ; Skotte, P.-U. ; Utterback, T. ; Paul, S. ; Kishkovich, O.P. ; Hudzik, J.S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.318-327,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator
Bjyrnyngen, P. ; Ekberg, M. ; ystrym, T. ; Fosshaug, H.A. ; Karlsson, J. ; Bjyrnberg, C. ; Nikolajeff, F.K. ; Karlsson, M.
Pub. info.: Optical Microlithography XVII.  pp.1866-1875,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
4.

Conference Proceedings
Conference Proceedings
4. Airborne molecular contamination control in the micromirror SLM-based deep ultraviolet DUV SIGMA7300 laser pattern generator
Ekberg, M. ; Fosshaug, H.A. ; Ostrom, T. ; Bjornangen, P. ; Utterback, T. ; Skotte, P.-U. ; Higley, J. ; Ruede, D. ; Kishkovich, O.P.
Pub. info.: Optical Microlithography XVII.  pp.1843-1857,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. PSM alignment for Sigma7300: signal quality and resist effects from using the writing DUV laser light spatial light modulator and a CCD camera as measurement tool for 2:nd layer alignment metrology
Ostrom, T. ; Lindau, S. ; Ekberg, M. ; Fosshaug, H.A. ; Zerne, R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1039-1049,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
6.

Conference Proceedings
Conference Proceedings
6. Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator
Fosshaug, H. ; Askebjer, P. ; Karlsson, J. ; Bajramovic, A. ; Xing, K. ; Eklund, R. ; Walford, J. ; Ekberg, M. ; Hogfeldt, P. ; ystrym, T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.879-894,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376