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10 results

Conference Proceedings

1. Recent apploaction resulta from the novel e-beam based mask repair system MeRiT MG [6281-28]

Ehrlich, C. ; Edinger, K. ; Hofmann, T. ; Degel, W.

Pub. info.:	EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810M-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6281

Conference Proceedings

2. PLD Epitaxial TiN and Pt Ohmic Metallizations to p-Type 6H-SiC Using Focused-Ion-Beam Surface Modification

Iliadis, A. A. ; Andronescu, S. N. ; Edinger, K. ; Orloff, J. H. ; Talyansky, V. ; Vispute, R. D. ; Sharma, R. P. ; Venkatesan, T. ; Wood, M. C. ; Jones, K. A.

Pub. info.:	Power semiconductor materials and devices : symposium held December 1-4, 1997, Boston, Massachusetts, U.S.A.. pp.253-, 1998. Warrendale, Penn.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	483

Conference Proceedings

3. Application data of the electron beam based photomask repair tool MeRiT MG

Ehrlich, C. ; Edinger, K. ; Boegli, V. ; Kuschnerus, P.

Pub. info.:	EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany. pp.145-154, 2005. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5835

Conference Proceedings

4. Electron-beam mask repair with induced reactions

Koops, H.W.P. ; Edinger, K. ; Bihr, J. ; Boegli, V.A. ; Greiser, J.

Pub. info.:	19th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.90-97, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5148

Conference Proceedings

5. Thermal imaging of microwave power GaAs-FET with scanning thermal nanoprobe

Joodaki, M. ; Janus, P. ; Gotszalk, T. ; Kompa, G. ; Edinger, K. ; Rangelow, I.W.

Pub. info.:	Nanoscale Optics and Applications. pp.202-207, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4809

Conference Proceedings

6. Application of electron-beam-induced processes to mask repair

Edinger, K. ; Boegli, V.A. ; Budach, M. ; Hoinkis, O. ; Weyrauch, B. ; Koops, H.W.P. ; Bihr, J. ; Greiser, J.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.383-390, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

7. Electron-beam-induced processes and their applicability to mask repair

Boegli, V.A. ; Koops, H.W.P. ; Budach, M. ; Edinger, K. ; Hoinkis, O. ; Weyrauch, B. ; Becker, R. ; Schmidt, R. ; Kaya, A. ; Reinhardt, A. ; Brauuer, C. ; Honold, H. ; Bihr, J. ; Greiser, J. ; Eisenmann, M.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.283-292, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

8. Demonstration of damage-free mask repair using electron beam-induced processes

Liang, T. ; Stivers, A.R. ; Penn, M. ; Bald, D. ; Sethi, C. ; Boegli, V. ; Budach, M. ; Edinger, K. ; Spies, P.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.291-300, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

Conference Proceedings

9. A novel electron-beam-based photomask repair tool

Edinger, K. ; Becht, H. ; Becker, R. ; Bert, V. ; Boegli, V.A. ; Budach, M. ; Gyhde, S. ; Guyot, J. ; Hofmann, T. ; Hoinkis, O. ; Kaya, A. ; Koops, H.W. ; Spies, P. ; Weyrauch, B. ; Bihr, J.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.1222-1231, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

10.

Conference Proceedings

10. Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool [5853-129]

Edinger, K. ; Boegli, V. ; Degel, W.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.361-370, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

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Author: Edinger, K.