1.

Conference Proceedings
Conference Proceedings
1. Characterization of imaging performance: considering both illumination intensity profile and lens aberration
Ebihara, T. ; Saito, H. ; Miyaharu, T. ; Okada, S. ; Shiode, Y. ; Shiozawa, T. ; Yoshihara, T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1693-1703,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Exposing the DUV SCAAM: 75-nm imaging on the cheap
Levenson, M.D. ; Ebihara, T.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.288-297,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
3.

Conference Proceedings
Conference Proceedings
3. Evaluation of various pitches of 100-nm contact holes applying IDEALSmile with high NA KrF scanner
Ebihara, T. ; Oga, T.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1247-1257,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. The vortex mask: making 80-nm contacts with a twist!
Levenson, M.D. ; Dai, G. ; Ebihara, T.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1293-1303,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. Vortex via process: analysis and mask fabrication for contact CDs <80 nm
Levenson, M.D. ; Tan, S.M. ; Dai, G. ; Morikawa, Y. ; Hayashi, N. ; Ebihara, T.
Pub. info.: Optical Microlithography XVI.  Part One  pp.344-370,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating
Liu, W. ; Mui, D. ; Lill, T. ; Wang, M.D. ; Bencher, C. ; Kwan, M. ; Yeh, W. ; Ebihara, T. ; Oga, T.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.841-848,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
7.

Conference Proceedings
Conference Proceedings
7. Beyond k1=0.25 lithography: 70-nm L/S patterning using KrF scanners
Ebihara, T. ; Levenson, M.D. ; Liu, W. ; He, J. ; Yeh, W. ; Ahn, S. ; Oga, T. ; Shen, M. ; M'saad, H.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.985-994,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
8.

Conference Proceedings
Conference Proceedings
8. Vortex via validation
Levenson, M.D. ; Ebihara, T. ; Morikawa, Y. ; Hayashi, N.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.93-102,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256