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Conference Proceedings

1. Novel high-index resists for 193-nm immersion lithography and beyond

I. Blakey ; L. Chen ; B. Dargaville ; H. Liu ; A. Whittaker ; W. Conley ; E. Piscani ; G. Rich ; A. Williams ; P. Zimmerman

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

2. Reflection control in hyper-NA immersion lithography

Z. Zhu ; E. Piscani ; K. Edwards ; B. Smith

Pub. info.:	Optical Microlithography XXI. 3 pp.69244A-1-69244A-7, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

Conference Proceedings

3. Characterization of CD-SEM metrology for iArF photoresist materials

A. Bunday ; A. Cordes ; N. G. Orji ; E. Piscani ; D. Cochran

Pub. info.:	Metrology, inspection, and process control for microlithography XXII. 1 pp.69221A-1-69221A-16, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6922

Conference Proceedings

4. Development of an operational high refractive index resist for 193nm immersion lithography

P. A. Zimmerman ; J. Byers ; E. Piscani ; B. Rice ; C. K. Ober

Pub. info.:	Advances in resist materials and processing technology XXV. 1 pp.692306-1-692306-10, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6923