1.

Conference Proceedings
Conference Proceedings
1. Analysis of Electrically Active Defects at Si(1OO)-HfO2 Interfaco
B. J. O'Sullivan ; E. O'Connor ; P. K. Hurley ; M. Modreanu ; F. Roussel ; N. Roussel ; M. A. Audiar ; J. P. Senateur ; Q. Fang ; I. W. Boyd ; C. Jimenez ; T. Leedham
Pub. info.: Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues.  pp.207-218,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-28
2.

Conference Proceedings
Conference Proceedings
2. The Formation and Characterisation of Lanthanum Oxide Based Si/High-κ/NiSi Gate Stacks by Electron-Beam Evaporation: An Examination of In-Situ Amorphous Silicon Capping and NiSi formation
P. Hurley ; M. Pijolat ; K. Cherkaoui ; E. O'Connor ; D. O'Connell
Pub. info.: Physics and technology of high-k gate dielectrics 5.  pp.145-156,  2007.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(4)