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11 results

Conference Proceedings

1. Evaluation of the 3D compositional heterogeneity effect on line-edge-roughness

S. Kang ; W. Wu ; V. M. Prabhu ; B. D. Vogt ; E. K. Lin ; K. Turnquest

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

2. Effect of photo-acid generator concentration and developer strength on the patterning capabilities of a model EUV photoresist

K. Choi ; V. M. Prabhu ; K. A. Lavery ; E. K. Lin ; W. Wu ; J. T. Woodward ; M. J. Leeson ; H. B. Cao ; M. Chandhok ; G. Thompson

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

3. Characterizing pattern structures using x-ray reflectivity

H. Lee ; C. L. Soles ; H. W. Ro ; S. Kang ; E. K. Lin ; A. Karim ; W. Wu ; D. R. Hines

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

4. Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results

C. Wang ; R. L. Jones ; E. K. Lin ; W. Wu ; J. S. Villarrubia ; K. Choi ; J. S. Clarke ; B. J. Rice ; M. Leeson ; J. Roberts ; R. Bristol ; B. Bunday

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

5. Identifying materials limits of chemically amplified photoresists

W. Wu ; V. M. Prabhu ; E. K. Lin

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

6. Porosity characteristics of ultra-low dielectric insulator films directly patterned by nano- imprint .lithography

H. W. Ro ; R. L. Jones ; H. Peng ; H.-J. Lee ; E. K. Lin

Pub. info.:	Emerging lithographic technologies XII. 1 pp.69211M-1-69211M-11, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6921

Conference Proceedings

7. Nanoimprint lithography for the direct patterning of nanoporous interlayer dielectric insulator materials

H. W. Ro ; H. Lee ; E. K. Lin ; A. Karim ; D. R. Hines ; D. Y. Yoon ; C. L. Soles

Pub. info.:	Emerging lithographic technologies XI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6517

Conference Proceedings

8. Direct measurement of the in-situ developed latent image: the residual swelling fraction

V. M. Prabhu ; B. D. Vogt ; S. Kang ; A. Rao ; E. K. Lin ; S. K. Satija ; K. Turnquest

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

9. FTIR measurements of compositional heterogeneities

S. Kang ; B. D. Vogt ; W. Wu ; V. M. Prabhu ; D. L. VanderHart ; A. Rao ; E. K. Lin ; K. Turnquest

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

10.

Conference Proceedings

10. Exploring the limitations of x-ray reflectivity as a critical dimension pattern shape metrology

H.-J. Lee ; S. Kim ; C. L. Soles ; E. K. Lin ; W. Wu

Pub. info.:	Metrology, inspection, and process control for microlithography XXII. 2 pp.692224-1-692224-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6922

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