Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.461-470, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Tomsick,J. ; Costa,E. ; Dwyer,J. ; Elsner,R. F. ; Ford,E. ; Kaaret,P. E. ; Novick,R. ; Santangelo,A. E. ; Silver,E. ; Soffitta,P. ; Weisskopf,M. C. ; Ziock,K. P.
Pub. info.:
EUV, X-ray, and gamma-ray instrumentation for astronomy VIII : 30 July - 1 August 1997, San Diego, California, Oswald H. W. Siegmund, Mark A. Gummin, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering. pp.373-383, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering