1.

Conference Proceedings
Conference Proceedings
1. Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
Van Den Broeke, D.J. ; Laidig, T.L. ; Chen, J.F. ; Wampler, K.E. ; Hsu, S.D. ; Shi, X. ; Socha, R.J. ; Dusa, M.V. ; Corcoran, N.P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.550-559,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Study of the influence of substrate topography on the focusing performance of advanced lithography scanners
Fontaine, B.M.L. ; Hauschild, J. ; Dusa, M.V. ; Acheta, A. ; Apelgren, E.M. ; Boonman, M. ; Krist, J. ; Khathuria, A. ; Levinson, H.J. ; Fumar-Pici, A. ; Pieters, M.
Pub. info.: Optical Microlithography XVI.  Part One  pp.570-581,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Flare and its impact on low-k1 KrF and ArF lithography
La Fontaine, B. ; Dusa, M.V. ; Acheta, A. ; Chen, C. ; Bourov, A. ; Levinson, H.J. ; Litt, L.C. ; Mulder, M. ; Seltman, R. ; van Praagh, J.
Pub. info.: Optical Microlithography XV.  Part One  pp.44-56,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
Hsu, S.D. ; Corcoran, N.P. ; Eurlings, M. ; Knose, W.T. ; Laidig, T.L. ; Wampler, K.E. ; Roy, S. ; Shi, X. ; Hsu, C.M. ; Chen, J.F. ; Finders, J. ; Socha, R.J. ; Dusa, M.V.
Pub. info.: Optical Microlithography XV.  Part One  pp.476-490,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Pattern displacement induced by lens aberrations
Hendrickx, E. ; Vandenberghe, G. ; Ronse, K.G. ; Colina, A. ; van der Hoff, A. ; Dusa, M.V. ; Finders, J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1155-1162,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Advanced process control applied to 90-nm lithography and etch
Kota, G.P. ; Luque, J. ; Dusa, M.V. ; Hunter, A.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.972-978,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
7.

Conference Proceedings
Conference Proceedings
7. Normal-incidence spectroscopic ellipsometry and polarized reflectometry for measurement and control of photoresist critical dimension
Holden, J.M. ; Gubiotti, T. ; McGaham, W.A. ; Dusa, M.V. ; Kiers, T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.1110-1121,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
8.

Conference Proceedings
Conference Proceedings
8. Understanding the forbidden pitch phenomenon and assist feature placement
Shi, X. ; Hsu, S. ; Chen, J.F. ; Hsu, M. ; Socha, R.J. ; Dusa, M.V.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.985-996,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
9.

Conference Proceedings
Conference Proceedings
9. Total test repeatability: a new figure of merit for CD metrology tools
Cramer, H. ; Kiers, T. ; Vanoppen, P. ; Meessen, J. ; Blok, F. ; Dusa, M.V.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1254-1264,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
10.

Conference Proceedings
Conference Proceedings
10. Novel diffraction-based spectroscopic method for overlay metrology
Yang, W. ; Lowe-Webb, R. ; Rabello, S. ; Hu, J. ; Lin, J.-Y. ; Heaton, J.D. ; Dusa, M.V. ; Boef, A.J. ; Schaar, M. ; Hunter, A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.200-207,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038