1.

Conference Proceedings
Conference Proceedings
1. Application results at 193nm: lithography emulation by aerial imaging and supplementary high resolution measurements
Zibold, A. M. ; Schmid, R. ; Bohm, K. ; Brunner, R. ; Durr, A. C.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.115-121,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
2.

Conference Proceedings
Conference Proceedings
2. An advanced study for defect disposition through 193-nm aerial imaging [6152-102]
Durr, A. C. ; Zibold, A. M. ; Bohm, K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
3.

Conference Proceedings
Conference Proceedings
3. Influence of mask manufacturing process on printing behavior of angled line structures [6154-168]
Teuber, S. ; Durr, A. C. ; Herguth, H. ; Kunkel, G. ; Wandel, T. ; Zell, T.
Pub. info.: Optical Microlithography XIX.  pp.61544C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
4.

Conference Proceedings
Conference Proceedings
4. The importance of being homogeneous: on the influence of illumination inhomogeneity on AIMS images [5992-99]
Durr, A. C. ; Bubke, K. ; Sczyrba, M. ; Angonin, S.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922Y-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. Limitations of optical reticle inspection for 45-nm node and beyond [6349-29]
Teuber, S. ; Bzdurek, A. ; Durr, A. C. ; Heumann, J. ; Holfeld, C.
Pub. info.: Photomask Technology 2006.  pp.63490T-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
6.

Conference Proceedings
Conference Proceedings
6. Inspectability and printability of lines and spaces halftone masks for the advanced DRAM node [6349-140]
Durr, A. C. ; Gutjahr, K. ; Heumann, J. ; Stengl, M. ; Katzwinkel, F. ; Frangen, A. ; Witte, T.
Pub. info.: Photomask Technology 2006.  pp.63493O-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
7.

Conference Proceedings
Conference Proceedings
7. Aerial image based mask defect detection in dense array structures [5853-85]
Kohle, R. ; Hennig, M. ; Pforr, R. ; Bubke, K. ; Sczyrba, M. ; Durr, A. C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.953-964,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853