Remiat, B ; Fusalba, F. ; Maury, P. ; Jousseaume, V ; Lecornec, C. ; Gaillard, F. ; Durand, I.
Pub. info.:
Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. pp.14-19, 2003. Pennington, N.J.. Electrochemical Society
Materials science of the cell : symposium held December 1-4, 1997, Boston, Massachusetts, U.S.A.. pp.199-, 1998. Warrendale, Pa.. MRS - Materials Research Society