1.

Conference Proceedings
Conference Proceedings
1. Line-edge roughness in sub-0.18-ｦﾌm resist patterns
Palmateer,S.C. ; Cann,S.G. ; Curtin,J.E. ; Doran,S.P. ; Eriksen,L.M. ; Forte,A.R. ; Kunz,R.R. ; Lyszczarz,T.M. ; Stern,M.B. ; Nelson,C.M.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.634-642,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Prospects for using existing resists for evaluating 157-nm imaging systems
Fedynyshyn,T.H. ; Kunz,R.R. ; Doran,S.P. ; Goodman,R.B. ; Lind,M.L. ; Curtin,J.E.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.335-346,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
3.

Conference Proceedings
Conference Proceedings
3. Encapsulated inorganic resist technology
Fedynyshyn,T.H. ; Doran,S.P. ; Lind,M.L. ; Sondi,I. ; Matijevic,E.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.627-637,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
4.

Conference Proceedings
Conference Proceedings
4. Performance of a phase-shift focus monitor reticle designed for 193-nm use
Kunz,R.R. ; Chan,M.Y. ; Doran,S.P.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.108-115,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
5.

Conference Proceedings
Conference Proceedings
5. Comparison of DNQ/novolac resists for e-beam exposure
Fedynyshyn,T.H. ; Doran,S.P. ; Lind,M.L. ; Lyszczarz,T.M. ; DiNatale,W.F. ; Lennon,D. ; Sauer,C.A. ; Meute,J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.600-614,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
6.

Conference Proceedings
Conference Proceedings
6. Performance of excimer lasers as light sources for 193-nm lithography
Sedlacek,J.H.C. ; Doran,S.P. ; Fritze,M. ; Kunz,R.R. ; Rothschild,M. ; Uttaro,R.S. ; Corliss,D.A.
Pub. info.: Optical Microlithography X.  pp.874-881,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
7.

Conference Proceedings
Conference Proceedings
7. Encapsulated inorganic resist technology applied to 157-nm lithography
Fedynyshyn,T.H. ; Sinta,R.F. ; Sworin,M. ; Goodman,R.B. ; Doran,S.P. ; Sondi,I. ; Matijevic,E.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.308-318,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
8.

Conference Proceedings
Conference Proceedings
8. High-resolution fluorocarbon-based resist for 157-nm lithography
Fedynyshyn,T.H. ; Kunz,R.R. ; Sinta,R.F. ; Sworin,M. ; Mowers,W.A. ; Goodman,R.B. ; Doran,S.P.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.296-307,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345