1.

Conference Proceedings
Conference Proceedings
1. A High Density, Pulsed RF Inductively Coupled Reactor for Sub- Half Micron Etch Applications
Ditizio, R.A. ; Jerde, L.G. ; Zhang, Y. ; Meyer, J.A. ; Zucker, M.L. ; Mantei, T.
Pub. info.: Proceedings of the eleventh International Symposium on Plasma Processing.  pp.89-95,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-12
2.

Conference Proceedings
Conference Proceedings
2. *SURFACE CONDITIONING ISSUES RELATED TO PATTERNING AND ETCHING
Fonash, S.J. ; Ditizio, R.A. ; Gu, T. ; Mikulan, P.I. ; Awadelkarim, O.O. ; Collins, R.W. ; Rembetski, J.F. ; Reinhardt, K.A. ; Chan, Y.D.
Pub. info.: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.55-68,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 259
3.

Conference Proceedings
Conference Proceedings
3. ELECTRONIC DEVICE FABRICATION USING ELECTRON CYCLOTRON RESONANCE ETCHING OF BORON DOPED HOMOEPITAXIAL DIAMOND FILMS
Grot, S.A. ; Ditizio, R.A. ; Gildenblat, G.Sh. ; Badzian, A.R. ; Fonash, S.J.
Pub. info.: Wide band gap semiconductors : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A..  pp.145-150,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 242