1.

Conference Proceedings
Conference Proceedings
1. Novel materials for 157-nm bilayer resist designs
Dilocker, S.J. ; Malik, S. ; De, B.B.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.627-632,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
2.

Conference Proceedings
Conference Proceedings
2. A HFIPS-based polymer approach for 157-nm single layer photoresist
Kanna, S. ; Mizutani, K. ; Yasunami, S. ; Kawabe, Y. ; Tan, S. ; Yagihara, M. ; Kokubo, T. ; Malik, S. ; Dilocker, S.J.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.612-621,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039