1.

Conference Proceedings
Conference Proceedings
1. Optical superlattices as phase-shift masks for microlithography
Carcia,P.F. ; French,R.H. ; Reynolds,G.A.M. ; Hughes,G.P. ; Torardi,C.C. ; Reilly,M.H. ; Lemon,M.F. ; Miao,C.R. ; Jones,D.J. ; Wilson,L. ; Dieu,L.
Pub. info.: Engineered nanostructural films and materials : 22-23 July 1999, Denver, Colorado.  pp.23-35,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3790
2.

Conference Proceedings
Conference Proceedings
2. Ion-beam sputter-deposited SiN/TiN attenuating phase-shift photoblanks
Dieu,L. ; Carcia,P.F. ; Mitsui,H. ; Ueno,K.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.810-817,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
3.

Conference Proceedings
Conference Proceedings
3. Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography
Nam,K.-H. ; Kim,L.-J. ; Jeong,H.-S. ; Lee,S.-W. ; Lee,I.-S. ; Shin,C. ; Kim,H.-S. ; Dieu,L. ; Paek,S.W. ; Koo,S.-S. ; Bae,S.-M. ; Ham,Y.-M. ; Shin,K.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.70-80,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409