1.

Conference Proceedings
Conference Proceedings
1. 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers
Sooriyakumaran,R. ; Fenzel-Alexander,D. ; Brock,P.J. ; Larson,C.E. ; DiPietro,R.A. ; Wallraff,G.M. ; Hofer,D.C. ; Dawson,D.J. ; Mahorowala,A.P. ; Angelopoulos,M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1171-1180,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Design of an etch-resistant cyclic olefin photoresist
Allen,R.D. ; Opitz,J. ; Wallow,T.I. ; DiPietro,R.A. ; Hofer,D.C. ; Jayaraman,S. ; Hullihan,K.A. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.463-471,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. Role of photoacid structure on the performance of 193-nm resists
Allen,R.D. ; Opitz,J. ; Larson,C.E. ; DiPietro,R.A. ; Breyta,G. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.44-54,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
4.

Conference Proceedings
Conference Proceedings
4. Positive bilayer resists for 248-and 193-nm lithography
Sooriyakumaran,R. ; Wallraff,G.M. ; Larson,C.E. ; Fenzel-Alexander,D. ; DiPietro,R.A. ; Opitz,J. ; Hofer,D.C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Angelopoulos,M. ; Lin,Q. ; Katnani,A.D.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.219-227,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. Reactive ion etching of 193-nm resist candidates: current platforms and future requirements
Wallow,T.I. ; Brock,P.J. ; DiPietro,R.A. ; Allen,R.D. ; Opitz,J. ; Sooriyakumaran,R. ; Hofer,D.C. ; Meute,J. ; Byers,J.D. ; Rich,G.K. ; McCallum,M. ; Schuetze,S. ; Jayaraman,S. ; Hullihen,K. ; Vicari,R. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.92-101,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
6.

Conference Proceedings
Conference Proceedings
6. Protecting groups for 193-nm photoresists
Allen,R.D. ; Sooriyakumaran,R. ; Opitz,J. ; Wallraff,G.M. ; DiPietro,R.A. ; Breyta,G. ; Hofer,D.C. ; Kunz,R.R. ; Jayaraman,S. ; Shick,R. ; Goodall,B. ; Okoroanyanwu,U. ; Wilson,C.G.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.334-343,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
7.

Conference Proceedings
Conference Proceedings
7. Limits to etch resistance for 193-nm single-layer resists
Kunz,R.R. ; Palmateer,S.C. ; Forte,A.R. ; Allen,R.D. ; Wallraff,G.M. ; DiPietro,R.A. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.365-376,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
8.

Conference Proceedings
Conference Proceedings
8. Lithographic performance of an environmentally stable chemically amplified photoresist(ESCAP)
Conley,W.E. ; Breyta,G. ; Brunsvold,W.R. ; DiPietro,R.A. ; Hofer,D.C. ; Holmes,S.J. ; Ito,H. ; Nunes,R. ; Fichtl,G. ; Hagerty,P. ; Thackeray,J.W.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.34-60,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724