1.

Conference Proceedings
Conference Proceedings
1. 44. Poly-Si gate CMOS with hafnium silicate gate dielectric
Hobbs, C. ; Grant, J. ; Kher, S. ; Dhandapani, V. ; Taylor, B. ; Dip, L. ; Hegde, R. ; Metzner, C. ; Tseng, H. ; Gilmer, D. ; Franke, A. ; Garcia, R. ; Ilebert, L. ; Azrak, M. ; Sing, D. ; Stephens, J.K ; Scrogum, C. ; Rai, R. ; Becnel, V ; Conner, I ; White, B. ; Tobin, P.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.361-366,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
2.

Conference Proceedings
Conference Proceedings
2. 31 New Materials, Processes and Device Structures for 65nm CMOS Technology Node and Beyond
Nguyen, B.-Y. ; Them, A. ; Zhang, D. ; White, T. ; Sadaka, M. ; Triyoso, D. ; Schaeffer, J. ; Goolsby, B. ; Dhandapani, V. ; Nguyen, T. ; Vartanian, V. ; McCormick, L. ; Theodore, D. ; Zollner, S. ; Xie, Q. ; Wang, X.-D. ; Canonico, M. ; Kotte, M. ; Shi, Z. ; Mathew, L. ; Zavala, M. ; Parker, C. ; Cottard, H. ; Hildreth, J. ; Prabhu, L. ; Rai, R. ; Murphy, S. ; Montgomery, P. ; Kalpat, S. ; Ramon, M. ; Demkov, A. ; Taylor, B. ; Gilmer, D. ; Adams, V. ; Jiang, J. ; Chen, J. ; Chang, C.-H. ; Kaushik, V. ; Chandna, L. ; Sadd, M. ; Barr, A. ; Vandooren, A. ; Pham, D. ; Mendlcino, M. ; Cheek, J. ; Tseng, H. ; White, B. ; Tobin, P. ; Orlowski, M. ; Venkatesan, S. ; Mogab, J. (Invited Paper)
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.259-273,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
3.

Conference Proceedings
Conference Proceedings
3. Evaluation Of Candidate Metals For Dual-Metal Gate Cmos With Hfo_2 Gate Dielectric
Samavedam, S.B. ; Schaeffer, J.K. ; Gilmer, D.C. ; Dhandapani, V. ; Tobin, P.J. ; Mogab, J. ; Nguyen, B-Y. ; Dakshina-Murthy, S. ; Rai, R.S. ; Jiang, Z-X. ; Martin, R. ; Raymond, M.V. ; Zavala, M. ; La, L.B. ; Smith, J.A. ; Gregory, R.B.
Pub. info.: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.85-90,  2002.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 716
4.

Conference Proceedings
Conference Proceedings
4. Factors Influencing the Threshold Voltages of Metal Oxide CMOS Devices
Hobbs, C. ; Fonseca, L. ; Samavedam, S. ; Grant, J. ; Dhandapani, V. ; Taylor, B. ; Dip, L. ; Triyoso, D. ; Gilmer, D. ; Schaeffer, J. ; Hegde, R. ; Tseng, H ; White, B. ; Tobin, P.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.313-320,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01