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14 results

Conference Proceedings

1. In Situ Monitoring of Thin Film Reactions During Rapid Thermal Annealing: Nickel Silicide Formation

Lavoje, C. ; Purtell, R. ; Cola, C. ; Detavernier, C. ; Desjardins, P. ; Jordan-Sweet, J. ; Cabral, C., Jr. ; d'Heurle, F.M. ; Harper., J.M.E.

Pub. info.:	Rapid thermal and other short-time processing technologies III : proceedings of the international symposium. pp.455-468, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-11

Conference Proceedings

2. 70 Reactive Diffusion in the Ni-Si System: Influence of Ni Thickness on the Phase Formation Sequence

Coia, C. ; Lavoie, C. ; d'Heurle, F. M. ; Desjardins, P. ; Detavernier, C. ; Kellock, A. J. (Invited Paper)

Pub. info.:	Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.585-596, 2005. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-05

Conference Proceedings

3. The Influence of Ti Capping Layers on CoSi2 Formation in the Presence of Interfacial Oxide

Detavernier, C. ; Donaton, R. A. ; Maex, K. ; Jin, S. ; Bender, H. ; Meirhaeghe, R. Van ; Cardon, F.

Pub. info.:	Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A.. pp.139-, 1999. Warrendale, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	564

Conference Proceedings

4. A BEEM Study of PtSi Schottky Contacts on Ion-Milled Si

Ru, G-P. ; Detavernier, C. ; Donaton, R. A. ; Blondeel, A. ; Clauws, P. ; Meirhaeghe, R. L. Van ; Cardon, F. ; Maex, K. ; Qu, X-P. ; Zhu, S-Y. ; Li, B-Z.

Pub. info.:	Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A.. pp.201-, 1999. Warrendale, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	564

Conference Proceedings

5. Formation and Characterization of SPE Grown Ultra-Thin Cobalt Disilicide Film

Qu, X-P. ; Ru, G-P. ; Li, B-Z. ; Detavernier, C. ; Meirhaeghe, R. L. Van ; Cardon, F.

Pub. info.:	Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A.. pp.157-, 1999. Warrendale, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	564

Conference Proceedings

6. Texture in Thin Films

Detavernier, C. ; Lavoie, C.

Pub. info.:	Textures of materials : ICOTOM 14 : Proceedings of the 14th International Conference on Textures of Materials, held in Leuven, Belgium, July 11-15, 2005. pp.1333-1342, 2005. Uetikon-Zuerich, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	495-497(2)

Conference Proceedings

7. Room Temperature Grain Growth in Sputtered Cu Films

Deduytsche, D. ; Detavernier, C. ; Debaerdemaeker, J. ; Van Meirhaeghe, R.L. ; Dauwe, C. ; Kuan, T.S.

Pub. info.:	Morphological and compositional evolution of thin films : symposium held December 2-5, 2002, Boston, Massachusetts, U.S.A.. pp.207-212, 2003. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	749

Conference Proceedings

8. A Study On (CO1-xNIxSI2) Schottky Contacts On N-SI(100) Substrates

Qu, Xin-Ping ; Detavernier, C. ; Van Meirhaeghe, R.L. ; Cardon, F. ; Lauwers, A. ; Maex, K. ; Li, Bing-Zong

Pub. info.:	Semiconductor technology (ISTC 2001) : proceedings of the 1st International Conference on Semiconductor Technology. pp.540-548, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-17

Conference Proceedings

9. CoSi2 Formation Using a Ti Capping Layer - The Influence of Processing Conditions on CoSi2 Nucleation

Detavernier, C. ; Meirhaeghe, R.L. Van ; Maex, K.

Pub. info.:	Gate stack and silicide issues in silicon processing II : symposium held April 17-19, 2001, San Francisco, California, U.S.A.. 2002. Warrendale, PA. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	670

10.

Conference Proceedings

10. Silicide Formation for Ni and Pd Bilayers on Si(100) Substrates

Qu, Xin-Ping ; Detavernier, C. ; Meirhaeghe, R.L. Van ; Cardon, F.

Pub. info.:	Gate stack and silicide issues in silicon processing II : symposium held April 17-19, 2001, San Francisco, California, U.S.A.. 2002. Warrendale, PA. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	670

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