1.

Conference Proceedings
Conference Proceedings
1. Effect of Replacing SiH4 for a Portion of the SiF4 in the HDP Deposition of Fluorine Doped SiO2
Denison, D.R.
Pub. info.: Proceedings of the Second International Symposium on Low and High Dielectric Constant Materials : Materials Science, Processing, and Reliability Issues.  pp.95-101,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-8
2.

Conference Proceedings
Conference Proceedings
2. Oxide Film Formation From Electron Cyclotron Resonance (ECR) Plasmas
Barbour, J.C. ; Apblett, C.A. ; Denison, D.R. ; Sullivan, J.P.
Pub. info.: Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.520-534,  1997.  Pennington, New Jersey.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-10
3.

Conference Proceedings
Conference Proceedings
3. Dependence of High-Density Plasma Deposited SiO2 Film Properties on Deposition Temperature
Denison, D.R.
Pub. info.: Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition.  pp.446-451,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-5