1.

Conference Proceedings
Conference Proceedings
1. 26 Tantalum-based Gate Electrode Metals for Advanced CMOS Devices
Hooker, J. C. ; Lander, R.J.P. ; Cubaynes, F. N. ; Schram, T. ; Roozeboom, F. ; van Zijl, J. ; Moos, M. ; van den Heuvel, F.C. ; Naburgh, E. ; van Berkum, J. G. M. ; Tamminga, Y. ; Dao, T. ; Henson, K. ; Schaekers, M. ; van Ammel, A. ; Tokei, Z. ; Demand, M. ; Dachs, C. (Invited Paper)
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.215-224,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
2.

Conference Proceedings
Conference Proceedings
2. Integration of HMOSTM Flash Memory in a 90 nm CMOS Technology
De Vos, J. ; Haspeslagh, L. ; Demand, M. ; Redolfi, A. ; Baerts, C. ; Beckx, S. ; Vleugels, F. ; Van Houdt, J.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.306-315,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-06