1.

Conference Proceedings
Conference Proceedings
1. New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry
Boher, P. ; Defranoux, C. ; Piel, J. P. ; Stehle, J. -L. P.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.126-137,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. * Characterization of ultra-thin Gate Dielectrics by Grazing X-Ray Reflectance and Spectroscopic Ellipsometry on the Same Instrument
Boher, P. ; Stehle, J.L. ; Defranoux, C. ; Bourtault, S. ; Piel, J.P. ; Evrard, P.
Pub. info.: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.67-78,  2001.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-9
3.

Conference Proceedings
Conference Proceedings
3. Spectroscopic Ellipsometry in the VUV Range Applied to the Characterization of Atomic Layer Deposited HfO2, Al2O3 and HfAIO x Thin Layers for High K Dielectrics
Boher, P. ; Defranoux, C. ; Bourtauld, S. ; Piel, J.P. ; Bender, H.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.305-315,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
4.

Conference Proceedings
Conference Proceedings
4. Optical Characterisation of High-? Materials Deposited by ALCVD
Bellandi, E. ; Crivelli, B. ; Elbaz, A. ; Alessandri, M. ; Boher, P. ; Defranoux, C.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.316-321,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
5.

Conference Proceedings
Conference Proceedings
5. Physical Characterization of Thin HfO2 Layers by the Combined Analysis with Complementary Techniques
Bender, H. ; Conard, T. ; Richard, O. ; Brijs, B. ; Petry, J. ; Vandervorst, W. ; Defranoux, C. ; Boher, P. ; Rochat, N. ; Wyon, C. ; Mack, P. ; Wolstenholme, J. ; Vitchev, R. ; Houssiau, L. ; Pireaux, J-J. ; Bergmaier, A. ; Dollinger, G.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.223-232,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
6.

Conference Proceedings
Conference Proceedings
6. Optical Characterisation of High-? Materials Deposited by ALCVD
Bellandi, E. ; Crivelli, B. ; Elbaz, A. ; Alessandri, M. ; Boher, P. ; Defranoux, C.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.316-321,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-3
7.

Conference Proceedings
Conference Proceedings
7. Spectroscopic Ellipsometry in the VUV Range Applied to the Characterization of Atomic Layer Deposited HfO2, A1203 and HfAIOx Thin Layers for High k Dielectrics
Boher, P. ; Defranoux, C. ; Bourtauld, S. ; Piel, J.P. ; Bender, H.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.305-315,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-3
8.

Conference Proceedings
Conference Proceedings
8. Characterization of High-k Dielectrics by Combined Spectroscopic Ellipsometry (SE) and X-Ray Reflectometry (XRR)
Sun, L. ; Defranoux, C. ; Stehle, J. L. ; Boher, P. ; Evrard, P. ; Bellandi, E. ; Bender, H.
Pub. info.: Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A..  pp.95-102,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 786
9.

Conference Proceedings
Conference Proceedings
9. Single-Shot Excimer Laser Annealing and In Process Ellipsometry Analysis for Ultra Shallow Junctions
Noguchi, T. ; Kerrien, G. ; Sarnet, T . ; Debarre, D. ; Boulmer, J. ; Zahorski, D. ; Hernandez, M. ; Defranoux, C. ; Laviron, C. ; Semeria, M.-N.
Pub. info.: Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A..  pp.33-38,  2002.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 717
10.

Conference Proceedings
Conference Proceedings
10. Physical Characterization of Thin HfO2 Layers by the Combined Analysis with Complementary Techniques
Bender, H. ; Brijs, B. ; Peby, J. ; Vandervorst, W. ; Defranoux, C. ; Boher, P. ; Rochat, N. ; Wyon, C. ; Mack, P. ; Woistenholme, I. ; Vitchev, R. ; Houssiau, L. ; Pireaux, J.-J. ; Bergmaier, A. ; Dollinger, G. ; Conard, T. ; Richard, O.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.223-232,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-3