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Conference Proceedings

1. Deposition of Ca+, Na+, Al+, K+ on Single-Crystal Si from DIH2O: NH4OH: H2O2 and DIH2O: HCL: H2O2 as Analyzed by ToF-SIMS and SPV

Debusk, Damon ; Lowell, John ; Reich, Fraser

Pub. info.:	Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA. pp.151-, 1995. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	386

Conference Proceedings

2. Measuring Diffusion Lengths in Epitaxial Silicon by Surface Photovoltage

Lowell, John ; Wenner, Valerie ; Debusk, Damon

Pub. info.:	Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA. pp.207-, 1995. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	386