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17 results

Conference Proceedings

1. Plasma Etched Micro-machined Silicon Stampers for Plastic Bio- Technology Applications

Weston, D. ; Dauksher, W.J. ; Rhine, D. ; Smekal, T. ; Rauf, S. ; Stout, P.J ; Ventzek, P.L.O.

Pub. info.:	Plasma processing XIV : proceedings of the international symposium. pp.227-238, 2002. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-17

Conference Proceedings

2. Advances in Step and Flash imprint lithography

Johnson, S.C. ; Bailey, T.C. ; Dickey, M.D. ; Smith, B.J. ; Kim, E.K. ; Jamieson, A.T. ; Stacey, N.A. ; Ekerdt, J.G. ; Willson, C.G. ; Mancini, D.P. ; Dauksher, W.J. ; Nordquist, K.J. ; Resnick, D.J.

Pub. info.:	Emerging Lithographic Technologies VII. 1 pp.197-202, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

Conference Proceedings

3. Imprint lithography: lab curiosity or the real NGL (Keynote Address)

Resnick, D.J. ; Dauksher, W.J. ; Mancini, D.P. ; Nordquist, K.J. ; Bailey, T.C. ; Johnson, S.C. ; Stacey, N.A. ; Ekerdt, J.G. ; Willson, C.G. ; Sreenivasan, S.V. ; Schumaker, N.E.

Pub. info.:	Emerging Lithographic Technologies VII. 1 pp.12-23, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

Conference Proceedings

4. Analysis of critical dimension uniformity for Step and Flash imprint lithography

Mancini, D.P. ; Gehoski, K.A. ; Dauksher, W.J. ; Nordquist, K.J. ; Resnick, D.J. ; Schumaker, P. ; McMackin, I.

Pub. info.:	Emerging Lithographic Technologies VII. 1 pp.187-196, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

Conference Proceedings

5. Image placement error due to pailern transfer for EUV masks

Masnyj, Z.S. ; Wasson, J.R. ; Lu, B. ; Weisbrod, E. ; Mangat, P.J.S. ; Nordquist, K.J. ; Ainley, E.S. ; Dauksher, W.J. ; Resnick, D.J.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1150-1154, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

6. Critical dimension and image placement issues for step and flash imprint lithography templates

Nordquist, K.J. ; Mancini, D.P. ; Dauksher, W.J. ; Ainley, E.S. ; Gehoski, K.A. ; Resnick, D.J. ; Masnyj, Z.S. ; Mangat, P.J.S.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1143-1149, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

7. A single-write self-aligned rim-phase-shift process

Garza, C.M. ; Wu, W. ; Roman, B.J. ; Mangat, P.J.S. ; Nordquist, K.J. ; Dauksher, W.J.

Pub. info.:	Optical Microlithography XVI. Part Two pp.979-985, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

8. Design and method of fabricating phase-shift masks for extreme-ultraviolet lithography by partial etching into the EUV multilayer mirror

Han, S.-I. ; Weisbrod, E. ; Xie, Q. ; Mangat, P.J.S. ; Hector, S.D. ; Dauksher, W.J.

Pub. info.:	Emerging Lithographic Technologies VII. 1 pp.314-330, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

Conference Proceedings

9. Integration of antireflection coatings on EUV absorber stacks

Wasson, J.R. ; Han, S.-I. ; Edwards, N.V. ; Weisbrod, E. ; Dauksher, W.J. ; Mangat, P.J.S. ; Pettibone, D.W.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.382-388, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

10.

Conference Proceedings

10. High-resolution templates for step and flash imprint lithography

Resnick, D.J. ; Dauksher, W.J. ; Mancini, D.P. ; Nordquist, K.J. ; Ainley, E.S. ; Gehoski, K.A. ; Baker, J.H. ; Bailey, T.C. ; Choi, B.J. ; Johnson, S. ; Sreenivasan, S.V. ; Ekerdt, J.G. ; Willson, C.G.

Pub. info.:	Emerging Lithographic Technologies VI. Part One pp.205-213, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4688

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