1.

Conference Proceedings
Conference Proceedings
1. Pattern fidelity in nanoimprinted films using CD-SAXS
Gehoski, K. A. ; Resnick, D. J. ; Dauksher, W. J. ; Nordquist, K. J. ; Ainley, E. ; McCord, M. ; Raphaelian, M. ; Hess, H.
Pub. info.: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.415-422,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5751
2.

Conference Proceedings
Conference Proceedings
2. Defect inspection for imprint lithography using a die to database electron beam verification system [6151-22]
Myron, L. J ; Thompson ; McMackin, I. ; Resnick, D. J. ; Kitamura, T. ; Hasebe, T ; Nakazawa, S ; Tokumoto, T. ; Ainley, E. ; Nordquist, K ; Dauksher, W. J.
Pub. info.: Emerging Lithographic Technologies X.  pp.61510M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
3.

Conference Proceedings
Conference Proceedings
3. Evaluation of FIB and e-beam repairs for implementation on step and flash imprint lithography templates [6151-50]
Young, S. R. ; Dauksher, W. J. ; Nordquist, K. J. ; Ainley, E. S. ; Gehoski, K. A. ; Graupera, A. A. ; Moriarty, M. H.
Pub. info.: Emerging Lithographic Technologies X.  pp.61511D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
4.

Conference Proceedings
Conference Proceedings
4. Inspection and repair issues for Step-and-Flash Imprint Lithography templates
Nordquist, K. J. ; Dauksher, W. J. ; Mancini, D. P. ; Resnick, D. J. ; Hess, H. F. ; Pettibone, D. W. ; Adler, D. ; Bertsche, K. ; White, R. ; Csuy, J. E. ; Lee, D.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.853-863,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
5.

Conference Proceedings
Conference Proceedings
5. Imprint technology: a potential low-cost solution for sub-45 nm device applications [6151-93]
Le, N. V. ; Dauksher, W. J. ; Gehoski, K. A. ; Nordquist, K. J. ; Ainley, E. ; Mangat, P.
Pub. info.: Emerging Lithographic Technologies X.  pp.61512K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
6.

Conference Proceedings
Conference Proceedings
6. Direct die-to-database electron-beam inspection of fused silica imprint templates [6349-86]
Tsuneoka, M. ; Hasebe, T. ; Tokumoto, T. ; Yan, C. ; Yamamoto, M. ; Resnick, D. J. ; Thompson, E. ; Wakamori, H. ; lnoue, M. ; Ainley, E. ; Nordquist, K. J. ; Dauksher, W. J.
Pub. info.: Photomask Technology 2006.  pp.63492D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
7.

Conference Proceedings
Conference Proceedings
7. Shaped beam technology for nano-imprint mask lithography
Hudek, P. ; Beyer, D. ; Groves, T. R. ; Fortagne, O. K. ; Dauksher, W. J. ; Mancini, D. P. ; Nordquist, K. J. ; Resnick, D. J.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.204-208,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504