1.

Conference Proceedings
Conference Proceedings
1. Mask process monitoring with optical CD measurements for sub-50-nm
K.-Y. Bang ; J.-B. Park ; J.-H. Roh ; D.-H. Chung ; S.-Y. Cho
Pub. info.: Photomask technology 2008.  2  pp.71222V-1-71222V-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
2.

Conference Proceedings
Conference Proceedings
2. 2D measurement using CD SEM for arbitrarily shaped patterns
H.-J. Lee ; S.-Y. Bae ; D.-H. Chung ; S.-G. Woo ; H. Cho
Pub. info.: Photomask technology 2007.  2  pp.673037-1-673037-8,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730