1.

Conference Proceedings
Conference Proceedings
1. Advanced Applications of Semiconductor Epitaxy for Cutting Edge Integrated Circuit Technolgy
D. Sadana ; M. Yang ; S.W. Bedell ; A. Reznicek ; J.P. de Souza
Pub. info.: SiGe and Ge, materials, processing, and devices.  pp.833-840,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(7)
2.

Conference Proceedings
Conference Proceedings
2. Substrate Engineering for Germanium-Based CMOS Technology
S.W. Bedell ; K. Fogel ; A. Reznicek ; J. Ott ; D. Sadana
Pub. info.: SiGe and Ge, materials, processing, and devices.  pp.807-816,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(7)
3.

Conference Proceedings
Conference Proceedings
3. Mixed Orientation Si-Si Interfaces by Hydrophilic Bonding and High Temperature Oxide Dissolution: Wafer Fabrication Technique and Device Applications
K. Saenger ; J. de Souza ; K. Fogel ; J. Ott ; A. Rezoicek ; H. Yin ; C. Sung ; D. Sadana
Pub. info.: Silicon-on-insulator technology and devices 13.  pp.295-308,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 6(4)
4.

Conference Proceedings
Conference Proceedings
4. High Mobility Channels for Ultimate CMOS
D. Sadana ; S. Koester ; Y. Sun ; E. W. Kiewra ; S. W. Bedell ; A. Reznicek ; J. Ott ; K. Fogel ; D. J. Webb ; J. Fompeyrine ; J. Locquet ; M. Sousa ; R. Germann
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment.  pp.343-354,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(2)