1.

Conference Proceedings
Conference Proceedings
1. Advanced process control for hyper-NA lithography based on CD-SEM measurement
T. Ishimoto ; K. Sekiguchi ; N. Hasegawa ; T. Maeda ; K. Watanabe ; G. Storms ; D. Laidler ; S. Cheng
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner
K. D'have ; T. Machida ; D. Laidler ; S. Cheng
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Cluster optimization to improve CD control as an enabler for double patterning
L. Tedeschi ; C. Rosslee ; D. Laidler ; P. Leray ; K. D'havé
Pub. info.: Lithography Asia 2008.  2  pp.714023-1-714023-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
4.

Conference Proceedings
Conference Proceedings
4. Sources of overlay error in double patterning integration schemes
D. Laidler ; P. Leray ; K. D'havé ; S. Cheng
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69221E-1-69221E-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922