1.

Conference Proceedings
Conference Proceedings
1. Characterization of oxynitride hard mask removal processes for refractory x-ray mask fabrication
Brooks,C.J. ; Benoit,D.E. ; Racette,K.C. ; Puisto,D.M. ; Whig,R. ; Dauksher,W.J. ; Cummings,K.D.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.255-260,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
2.

Conference Proceedings
Conference Proceedings
2. Challenges and opportunities for 157-nm mask technology
Mulkens,J. ; Wagner,C. ; Cummings,K.D. ; George,R.A.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.372-385,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Forbidden pitches for 130-nm lithography and below
Socha,R.J. ; Dusa,M.V. ; Capodieci,L. ; Finders,J. ; Chen,J.F. ; Flagello,D.G. ; Cummings,K.D.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1140-1155,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. SNR200 chemically amplified resist optimization
Rocque,J.M. ; Puisto,D.M. ; Resnick,D.J. ; Cummings,K.D. ; Chu,W. ; Seese,P.A.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.90-99,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
5.

Conference Proceedings
Conference Proceedings
5. Ring-test aberration determination and device lithography correlation
Garza,C.M. ; Conley,W. ; Roman,B.J. ; Schippers,M. ; Foster,J. ; Baselmans,J. ; Cummings,K.D. ; Flagello,D.G.
Pub. info.: Optical Microlithography XIV.  4346  pp.36-44,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. Application of the aberration ring test (ARTEMIS) to determine lens quality and predict its lithographic performance
Moers,M.H. ; Laan,H.van der ; Zellenrath,M. ; Boeij,W.de ; Beaudry,N.A. ; Cummings,K.D. ; Zwol,A.van ; Becht,A. ; Willekers,R.
Pub. info.: Optical Microlithography XIV.  4346  pp.1379-1387,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346