1.

Conference Proceedings
Conference Proceedings
1. Methodology for modeling and simulating line-end shortening effects in deep-UV resist
Cheng, M. ; Croffie, E. H. ; Neureuther, A. R.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.867-876,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Efficient simulation of postexposure bake processes in STORM
Croffie, E. H. ; Cheng, M. ; Zuniga, M. A. ; Neureuther, A. R.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1227-1234,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Achieving mask-based imaging with optical maskless lithography [6151-87]
Stone, E. M. ; Hintersteiner, J. D. ; Cebuhar, W. A. ; Albright, R. ; Eib, N. K. ; Latypov, A. ; Baba-Ali, N. ; Poultney, S. K. ; Croffie, E. H.
Pub. info.: Emerging Lithographic Technologies X.  pp.61512E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
4.

Conference Proceedings
Conference Proceedings
4. Sensitivity of the 65-nm poly line printability to sPSM manufacturing errors
Belova, N. ; Jensen, J. V. ; Croffie, E. H. ; Callan, N. P.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.691-699,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567