1.

Conference Proceedings
Conference Proceedings
1. Hard pellicle investigation for 157-nm lithography: impact on overlay
Bruls, R. ; Uitterdijk, T. ; Cicilia, O. ; De Bisschop, P. ; Kocsis, M. K. ; Grenville, A. ; Van Peski, C. K. ; Engelstad, R. L. ; Chang, J. ; Cotte, E. P. ; Okada, K. ; Ohta, K. ; Mishiro, H. ; Kikugawa, S.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.1-11,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
2.

Conference Proceedings
Conference Proceedings
2. Numerical and experimental study of oxide growth on EUV mask capping layers
Cotte, E. P. ; Holfeld, C. ; Dersch, U. ; Ruhl, G. ; Perlich, J.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.751-761,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
3.

Conference Proceedings
Conference Proceedings
3. Pellicle choice for 193-nm immersion lithography photomasks
Cotte, E. P. ; HaBler, R. ; Utess, B. ; Antesberger, G. ; Kromer, F. ; Teuber, S.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.511-520,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567