1.

Conference Proceedings
Conference Proceedings
1. Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
Van Den Broeke, D.J. ; Laidig, T.L. ; Chen, J.F. ; Wampler, K.E. ; Hsu, S.D. ; Shi, X. ; Socha, R.J. ; Dusa, M.V. ; Corcoran, N.P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.550-559,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
Hsu, S.D. ; Corcoran, N.P. ; Eurlings, M. ; Knose, W.T. ; Laidig, T.L. ; Wampler, K.E. ; Roy, S. ; Shi, X. ; Hsu, C.M. ; Chen, J.F. ; Finders, J. ; Socha, R.J. ; Dusa, M.V.
Pub. info.: Optical Microlithography XV.  Part One  pp.476-490,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Reticle defect printability for sub-0.3k1 chromeless phase lithography (CPL) technology
Hsu, S. ; Van Den Broeke, D.J. ; Shi, X. ; Chen, J.F. ; Knose, W.T. ; Corcoran, N.P. ; Vedula, S. ; MacNaughton, C.W. ; Richie, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.373-383,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
4.

Conference Proceedings
Conference Proceedings
4. Contact hole reticle optimization by using interference mapping lithography (IML)
Socha, R.J. ; Van Den Broeke, D.J. ; Hsu, S.D. ; Chen, J.F. ; Laidig, T.L. ; Corcoran, N.P. ; Hollerbach, U. ; Wampler, K.E. ; Shi, X. ; Conley, W.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.516-534,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446