1.

Conference Proceedings
Conference Proceedings
1. Photoresist line-edge roughness analysis using scaling concepts
Constantoudis, V. ; Patsis, G.P. ; Gogolides, E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.901-909,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists
Ercken, M. ; Leunissen, L.H.A. ; Pollentier, I. ; Patsis, G.P. ; Constantoudis, V. ; Gogolides, E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.266-275,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
3.

Conference Proceedings
Conference Proceedings
3. Toward a complete description of linewidth roughness: a comparison of different methods for vertical and spatial LER and LWR analysis and CD variation
Constantoudis, V. ; Patsis, G.P. ; Leunissen, L.H.A. ; Gogolides, E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.967-977,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
4.

Conference Proceedings
Conference Proceedings
4. Material origins of line-edge roughness: Monte Carlo simulations and scaling analysis
Patsis, G.P. ; Constantoudis, V. ; Gogolides, E.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.773-781,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376