1.

Conference Proceedings
Conference Proceedings
1. Dual damascene photo process using negative-tone resist
Shi,X. ; Fung,A.C. ; Hsu,S. ; Li,Z. ; Nguyen,T. ; Socha,R.J. ; Conley,W.E. ; Dusa,M.V.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.835-842,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Photosensitization in dyed and undyed APEX-E DUV resist
Sturtevant,J.L. ; Conley,W.E. ; Webber,S.E.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.273-286,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
3.

Conference Proceedings
Conference Proceedings
3. Understanding the impact of full-field mask error factor
Conley,W.E. ; Shi,X. ; Hankinson,M. ; Dusa,M.V. ; Socha,R.J. ; Garza,C.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.580-587,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Polymers for 157-nm photoresist applications:a progress report
Patterson,K. ; Yamachika,M. ; Hung,R. ; Brodsky,C.J. ; Yamada,S. ; Somervell,M.H. ; Osborn,B. ; Hall,D. ; Dukovic,G. ; Byers,J.D. ; Conley,W.E. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.365-374,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
5.

Conference Proceedings
Conference Proceedings
5. Lithographic performance of an environmentally stable chemically amplified photoresist(ESCAP)
Conley,W.E. ; Breyta,G. ; Brunsvold,W.R. ; DiPietro,R.A. ; Hofer,D.C. ; Holmes,S.J. ; Ito,H. ; Nunes,R. ; Fichtl,G. ; Hagerty,P. ; Thackeray,J.W.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.34-60,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
6.

Conference Proceedings
Conference Proceedings
6. Viability of conventional high-NA KrF imaging for sub-0.25-ｦﾌm lithography
Farrell,T.R. ; Nunes,R. ; Campbell,R. ; Hoh,P. ; Samuels,D.J. ; Kirk,J.P. ; Conley,W.E. ; Iba,J. ; Shibata,T.
Pub. info.: Optical Microlithography IX.  Part1  pp.46-53,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726