1.

Conference Proceedings
Conference Proceedings
1. Comparisons of critical parameters for high- and low-activation-energy deep-UV photoresists
Conley,W. ; Babcock,C.P. ; Farrar,N.R. ; Liu,H.-Y. ; Peterson,B. ; Taira,K.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.357-365,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Real-time amine monitoring and its correlation to critical dimension control of chemically amplified resists for sub-0.25-ｦﾌm geometries
Conley,W. ; Babcock,C.P. ; Lilygren,J.A. ; Sandstrom,C.P. ; Farrar,N.R. ; Piatt,J. ; Kincad,D. ; Goodwin,B. ; Kishkovich,O. ; Higley,J. ; Cate,P.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.924-930,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices
Conley,W. ; Brunsvold,W.R. ; Buehrer,F. ; Dellaguardia,R. ; Dobuzinsky,D. ; Farrell,T.R. ; Ho,H. ; Katnani,A.D. ; Keller,R. ; Marsh,J. ; Muller,P. ; Nunes,R. ; Ng,H.Y. ; Oberschmidt,J.M. ; Ryan,D. ; Cotler-Wagner,T. ; Schulz,R. ; Ito,H. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.282-299,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
4.

Conference Proceedings
Conference Proceedings
4. PHS with inert blocking groups for DUV negative resist
Brunsvold,W.R. ; Conley,W. ; Varanasi,P.R. ; Khojasteh,M. ; Patel,N.M. ; Molless,A.F. ; Neisser,M.O. ; Breyta,G.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.372-384,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
5.

Conference Proceedings
Conference Proceedings
5. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results
Socha,R.J. ; Shi,X. ; Holman,K.C. ; Dusa,M.V. ; Conley,W. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Chu,M.C. ; Su,C. ; Huang,K. ; Chen,C. ; Le,C. ; Pierrat,C. ; Su,B.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.38-54,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
6.

Conference Proceedings
Conference Proceedings
6. Challenge of 1-Gb DRAM development when using optical lithography
Farrell,T.R. ; Nunes,R. ; Samuels,D.J. ; Thomas,A. ; Ferguson,R.A. ; Molless,A. ; Wong,A.K. ; Conley,W. ; Wheeler,D.C. ; Credendino,S. ; Naeem,M. ; Hoh,P. ; Lu,Z.
Pub. info.: Optical Microlithography X.  pp.333-341,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
7.

Conference Proceedings
Conference Proceedings
7. Ring-test aberration determination and device lithography correlation
Garza,C.M. ; Conley,W. ; Roman,B.J. ; Schippers,M. ; Foster,J. ; Baselmans,J. ; Cummings,K.D. ; Flagello,D.G.
Pub. info.: Optical Microlithography XIV.  4346  pp.36-44,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
8.

Conference Proceedings
Conference Proceedings
8. The MEEF shall inherit the Earth
Conley,W. ; Garza,C.M. ; Dusa,M.V. ; Socha,R.J. ; Bendik,J.J. ; Mack,C.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.251-258,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
9.

Conference Proceedings
Conference Proceedings
9. Resist materials for 157-nm microlithography: an update
Willson,C.G. ; Tran,H.V. ; Trinque,B.C. ; Chiba,T. ; Yamada,S. ; Sanders,D.P. ; Connor,E.F. ; Grubbs,R.H. ; Klopp,J.M. ; Frechet,J.M.J. ; Thomas,B.H. ; Shafer,G.J. ; DesMarteau,D.D. ; Conley,W. ; Willson,C.G.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.385-395,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
10.

Conference Proceedings
Conference Proceedings
10. Integration of ultrathin resist processes into MPU IC manufacturing flows
Cobb,J.L. ; Conley,W. ; Guenther,T. ; Huang,F. ; Lee,J.J. ; Lii,T. ; Dakshina-Murthy,S. ; Parker,C. ; Usmani,S. ; Wu,W. ; Hector,S.D.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.261-272,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345