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Conference Proceedings

1. Optical emission endpoint optimization in the tetra etch chamber for production of embedded phase-shift photomasks

Brooks, C.B. ; Anderson, S. ; Anderson, R.B. ; Collard, C. ; Clevenger, J. ; Sandlin, N.L. ; Buie, M.J.

Pub. info.:	19th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.235-243, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5148

Conference Proceedings

2. Integrated phase shift measurements for advanced mask etch process control

Sahin, T. ; Collard, C. ; Anderson, S.A. ; Mak, A.W. ; Brooks, C.B. ; Buie, M.J. ; Walsh, P. ; Li, G.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.76-84, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

3. Optimization of chrome dry etch in Tetra II using asymmetrically loaded patterns

Brooks, C.B. ; Anderson, R.B., III ; Clevenger, J.O. ; Collard, C. ; Halim, M. ; Sahin, T. ; Mak, A.W.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.749-757, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

4. Examination of various endpoint methods for chrome mask etch

Collard, C. ; Anderson, S.A. ; Anderson, R.B., III ; Clevenger, J.O. ; Halim, M. ; Brooks, C.B. ; Buie, M.J. ; Sahin, T.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.744-748, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256