1.

Conference Proceedings
Conference Proceedings
1. Design considerations for bottom antireflective coating for 157-nm lithography
Claypool, J.B. ; Puligadda, R. ; Akers, J. ; Sakamoto, R. ; Mizusawa, K.-I.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1065-1073,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Thin organic bottom antireflective coatings for 193-nm lithography
Bhave, M. ; Meador, J.D. ; Claypool, J.B. ; Deshpande, S.V. ; Akers, J. ; Lindgren, A.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1074-1084,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. New materials for 193-nm bottom antireflective coatings
Weimer, M. ; Krishnamurthy, V. ; Fowler, S. ; Nesbit, C. ; Claypool, J.B.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.866-871,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039