1.

Conference Proceedings
Conference Proceedings
1. Study of Pulsed RF DPN Process Parameters for 65 um node MOSFET Gate Dielectrics
Rothschild, A. ; Kraus, P.A. ; Chua, T.C. ; Nouri, F. ; Cubaynes, F.N. ; Veloso, A. ; Mertens, S. ; Date, L. ; Schreutelkamp, R. ; Schaekers, M.
Pub. info.: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.49-56,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 811
2.

Conference Proceedings
Conference Proceedings
2. Further Optimization of Plasma Nitridation of Ultra-thin Oxides for 65 nm 236 Node MOSFETs
Kraus, P.A. ; Chua, T.C. ; Rothschild, A. ; Cubaynes, F.N ; Veloso, A. ; Mertens, S. ; Date, L. ; Baue, T.M. ; Ahmed, K.Z. ; Campbell, J. ; Noun, F. ; Cruse, J. ; Schreutelkamp, R. ; Schaekers, M.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.236-243,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
3.

Conference Proceedings
Conference Proceedings
3. Recent Progress in Gate Dielectric Scaling
Higashi, G. ; Kraus, P. ; Chua, T.C. ; Olsen, C. ; Ahmed, K. ; Nouri, F. ; Kher, S.S. ; Sharangpani, R. ; Deaton, P. ; Ulloa, E.J. ; Tevatia, G. ; Narwankar, P.K.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.271-277,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01