1.

Conference Proceedings
Conference Proceedings
1. Dipole options for 90-nm lithography technologies and below
Chua, G.S. ; Tay, C.J. ; Quan, C. ; Lin, Q. ; Chua, L.-H.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1284-1295,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Sub-0.10-μm lithography technology with resolution enhancement technique
Chua, G.S. ; Lin, Q. ; Tay, C.J. ; Quan, C.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1563-1574,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. MEF studies for attenuated phase-shift mask for sub-0.13-μm technology using 248 nm
Tan, S.K. ; Lin, Q. ; Chua, G.S. ; Quan, C. ; Tay, C.J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1366-1372,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Rigorous diffraction analysis using geometrical theory of diffraction for future mask technology
Chua, G.S. ; Tay, C.J. ; Quan, C. ; Lin, Q.
Pub. info.: Optical Microlithography XVII.  pp.1267-1278,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377