1.

Conference Proceedings
Conference Proceedings
1. Improved process latitude photolithography 0.18-ｦﾌm technology using multiple focal planes
Callec,A.-S. ; Chollet,J.-P.E.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1092-1099,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Optimization of i-line resist process for 0.5-ｦﾌm polysilicon gate structures using a top-coat layer
Chollet,J.-P.E. ; Basso,M.-T.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.747-753,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724