1.

Conference Proceedings
Conference Proceedings
1. Develop process optimization for CD uniformity improvement
Shin,J.-C. ; Won,J.-I. ; Jung,H.-Y. ; Kim,M.-S. ; Choi,Y.-K. ; Han,O.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.540-548,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
2.

Conference Proceedings
Conference Proceedings
2. KrF attenuated PSM defect printability and detectability for 120-nm actual DRAM patterning process
Kim,J. ; Kim,S.-C. ; Kim,H.-C. ; Lee,S.-I. ; Choi,Y.-K. ; Ham,Y.-M. ; Han,O.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.287-296,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
3.

Conference Proceedings
Conference Proceedings
3. New photomask patterning method based on KrF stepper
Ha,T.-J. ; Choi,Y.-K. ; Han,O.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.522-529,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562